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DC three target magnetron co-sputtering complex coating machine

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Product
DC three target magnetron co-sputtering complex coating machine
Posting date : Jul 17, 2020
Membership
Free Member Scince Jul 13, 2020
FOB Price
28000
Min. Order Quantity
1
Supply Abillity
50
Port
qingdao,shanghai,
Payment Terms
T/T, L/C, Pay Later,Western Union,VISA
Package
wooden box packaging
Keyword :
Category
Contact
jibin wang
Product Detail
Company Info
 
Quick Detail
Place of Origin
China [CN]
Brand Name
CYKY
Model Number
CY-MSP300S-3DC
HS-CODE
8479-89
Package & Delivery Lead Time
Package
wooden box packaging
Delivery Lead Time
30 days
Detailed Description

Three targets DC magnetron sputtering coater CY-MSP300S-3DC

Three targets DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with 500W DC power supply. The DC power supply can be used for the preparation of metal film. The three targets can meet the needs of multi-layer or multiple coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.
 
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
 

Three targets DC magnetron sputtering coater application:

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, this three targets magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
 

Three targets DC magnetron sputtering coater technical parameters:

Sample stage
Size:φ185mm
Temperature control accuracy:±1℃
Heating temperature:Max 500℃
Rotate speed:1-20rpm adjustable
Magnetron Sputtering   target head
Quantity:2”×3 (1”,2” optional)
Water chiller:Circulating water chiller with flow rate of 10L/min
Vacuum chamber
Chamber size:φ300mm×300mm
Watch window:φ100mm
Chamber material:Stainless steel
Opening mode:Top cover open
Mass flowmeter
2 channels; measuring   range 100sccm; 100sccm (can be customized according to customer needs)
Vacuum system
Model:CY-GZK103-A
Pumping interface:KF40
Molecular pump:CY-600
Exhaust interface:KF16
Backing pump:rotary vane pump
Vacuum measurement:Compound vacuum gauge
Ultimate vacuum:1.0E-5Pa
Power supply:AC;220V 50/60Hz
Pumping rate:Molecular pump:   600L/S  rotary vane pump: 1.1L/S  
Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes
Power configuration
DC power supply×3;Max output power:DC 500 W
Other parameters
Supply voltage:AC220V,50Hz
Overall size:600mm×650mm×1280mm
Total power:3KW
Total Weight:300kg
 

ECROBOT CO., Ltd, Business Registration Number : 220-88-71747, CEO Park Jae Woo, TEL : +82-2-552-7676, E-mail : info@unt-systems.com
Address : (Hwanghwa B/D 11F, Yeoksam-dong)320, Gangnam-daero, Gangnam-gu, Seoul, South Korea
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